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    Title :

    Feasibility and applicability of integrated metrology using spectroscopic ellipsometry in a cluster tool [4449-10]


    Contributors:

    Conference:

    Conference; 2nd, Optical metrology roadmap for the semiconductor, optical, and data storage industries ; 2001 ; San Diego, CA



    Publication date :

    2001-01-01


    Size :

    11 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    IR spectroscopic ellipsometry for industrial characterization of semiconductors [4449-09]

    Boher, P. / Bucchia, M. / Piel, J. P. et al. | British Library Conference Proceedings | 2001


    Recent developments in spectroscopic ellipsometry for in-situ applications (Invited Paper) [4449-07]

    Johs, B. D. / Hale, J. / Ianno, N. J. et al. | British Library Conference Proceedings | 2001


    Nr. 4449

    DataCite | 1930



    Interferometric metrology of wafer nanotopography for advanced CMOS process integration (Invited Paper) [4449-21]

    Valley, J. F. / Koliopoulos, C. L. / Tang, S. et al. | British Library Conference Proceedings | 2001