Lifetime assessment of hollow cathode (HC) sources is an experimentally demanding process, due to the large amount of hours space qualification requires. In this Paper, we present a one-dimensional orifice model coupled to a global-averaged insert model, developed for lifetime prediction of a HC neutralizer in terms of orifice erosion; a modified sputtering yield curve is derived, similar to a previous literature work, and the role of anomalous resistivity is discussed in view of the erosion profile. Variations on the active length parameter, required for the insert modeling, are seen to affect the orifice plasma profiles and the erosion to a lesser degree, and the time evolution of the orifice channel confirms the expected asymptotic decrease of the erosion rate.


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    Title :

    One-Dimensional Model for Hollow Cathode Orifice Lifetime Prediction


    Contributors:

    Published in:

    Publication date :

    2021-07-01




    Type of media :

    Article (Journal)


    Type of material :

    Electronic Resource


    Language :

    English




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