The possibilities of ellipsometric method for optimization of identification of refractive index of oxynitride dielectric films have been reviewed, the possibility of ellipsometry for identification of the thickness and optical constants of metal films and semiconductor compound FeSi2.


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    Title :

    ELLIPSOMETRIC METHODS FOR CONTROL OF PARAMETERS OF MATERIALS AND RADIOELECTRONICS STRUCTURES


    Contributors:
    S. Bogolyubovа (author) / E. Polyakova (author) / R. Rezvyi (author)


    Publication date :

    2016




    Type of media :

    Article (Journal)


    Type of material :

    Electronic Resource


    Language :

    Unknown




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