We utilize a CO/sub 2/ laser in the deposition process because SiH/sub 4/ molecules have high photon absorption of laser light. This absorption increases the decomposition of SiH/sub 4/ molecules and helps form the Si-nanostructures in low-temperature growth.


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    Title :

    Low-temperature growth of Si-nanostructures by laser assistance of conventional plasma enhanced chemical vapor deposition


    Contributors:


    Publication date :

    2003-01-01


    Size :

    82717 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English