We present a two-step method for the direct fabrication of functional three-dimensional photonic crystals in high index of refraction (n=2.45) arsenic-sulphur based thin films. Complete fabrication cycles can be as short as a few hours.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Direct laser writing of three-dimensional photonic crystals in high index of refraction chalcogenide glasses


    Contributors:
    von Freymann, G. (author) / Wong, S. (author) / Ozin, G.A. (author)


    Publication date :

    2005-01-01


    Size :

    1564990 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English




    Theoretical Study of Light Refraction in Three-Dimensional Photonic Crystals

    Chen, X. / Jiang, W. / Chen, J. et al. | British Library Online Contents | 2007


    Octonacci photonic crystals with negative refraction index materials

    Brandão, E.R. / Vasconcelos, M.S. / Anselmo, D.H.A.L. | British Library Online Contents | 2016


    Negative refraction in photonic crystals

    Notomi, M. | British Library Online Contents | 2002