Impurities detected nondestructively during processing. In proposed system, surface of growing amorphous-silicon film monitored by ellipsometer at wavelength or combination of wavelengths at which impurity or impurities of interest absorb light strongly.
Ellipsometric Monitoring of Film Deposition
NASA Tech Briefs ; 10 , 4
1986-07-01
Miscellaneous
No indication
English
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