Access

    Access via TIB

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Deep reactive ion etching of silica for planar lightwave circuits using indigenously developed ECR/RIE system [4417-32]



    Conference:

    International conference, Fiber optics and photonics; Photonics 2000 ; 2000 ; Calcutta, India



    Publication date :

    2001-01-01


    Size :

    4 pages




    Type of media :

    Conference paper


    Type of material :

    Print


    Language :

    English




    Trimming Silica Planar Lightwave Circuits Using Deep Ultraviolet Ultrafast Lasers

    Chen, K. | British Library Conference Proceedings | 2005



    Nr. 4417

    DataCite | 1930


    Er3-Doped Silica-Based Planar Lightwave Circuits

    IEEE; Lasers and Electro-Optics Society / IEEE; Electron Devices Society | British Library Conference Proceedings | 1994


    Interferometric circuits: analysis, configurations, applications [4417-16]

    Schwelb, O. / SPIE - The International Society for Optical Engineering / Central Glass and Ceramic Research Institute et al. | British Library Conference Proceedings | 2001