Deep reactive ion etching of silica for planar lightwave circuits using indigenously developed ECR/RIE system [4417-32]
International conference, Fiber optics and photonics; Photonics 2000 ; 2000 ; Calcutta, India
01.01.2001
4 pages
Aufsatz (Konferenz)
Englisch
photonics , glass , fiber optics , SPIE
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