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    Title :

    Argon plasma inductively coupled plasma reactive ion etching study for smooth sidewall thin film lithium niobate waveguide application


    Contributors:
    Ulliac, G. (author) / Calero, V. (author) / Ndao, A. (author) / Baida, F.I. (author) / Bernal, M.-P. (author)

    Published in:

    Publication date :

    2016-01-01


    Size :

    5 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    Unknown


    Classification :

    DDC:    535





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