We are developing a novel lithography system for nanometric scale pattern fabrication using near-field technology. We have built our own scanning shear force microscope for this purpose, where a micropipette is used as a probe. Using shear force distance regulation, the pipette probe follows the sample surface topography and on the desired point, photoresist is ejected on to the sample surface by applying pressure on the other side of pipette using an inchworm. Various patterns can be fabricated by scanning the sample and by control of photoresist ejection.


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    Title :

    Nano-lithography using micropipette


    Contributors:
    Mun-Heon Hong, (author) / Ki-Hyun Kim, (author) / Joon-Ho Bae, (author) / Wonho Jhe, (author)


    Publication date :

    1999-01-01


    Size :

    107535 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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