We demonstrate polarization dependence of the etch rate in femtosecond laser fabrication of 3-D microfluidic channels. We also show the existence of an energy threshold at which etching becomes highly selective.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    3-D fabrication of microfluidic channels in fused silica using focused femtosecond laser beams


    Contributors:
    Hnatovsky, C. (author) / Taylor, R.S. (author) / Bhardwaj, R. (author) / Simova, E. (author) / Rayner, D.M. (author) / Corkum, P.B. (author)


    Publication date :

    2005-01-01


    Size :

    1735933 byte




    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English