We demonstrate polarization dependence of the etch rate in femtosecond laser fabrication of 3-D microfluidic channels. We also show the existence of an energy threshold at which etching becomes highly selective.
3-D fabrication of microfluidic channels in fused silica using focused femtosecond laser beams
(CLEO). Conference on Lasers and Electro-Optics, 2005. ; 3 ; 2040-2042 Vol. 3
01.01.2005
1735933 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
British Library Conference Proceedings | 2005
|Nonlinear Optics of Femtosecond Laser-Modified Fused Silica: Applications to Waveguide Fabrication
British Library Conference Proceedings | 2005
|