To enable in-line nanophotonic device monitoring, grating couplers for near-vertical wafer-scale optical probing are fabricated in a standard CMOS process. These partially etched “optical probes” demonstrate a robust 3-dB-bandwidth larger than 80 nm allowing for photonic device characterization over the entire C-band throughout the fabrication process.


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    Title :

    Grating couplers as optical probe pads in a standard CMOS process


    Contributors:
    Hofrichter, J. (author) / Green, W. M. J. (author) / Horst, F. (author) / Assefa, S. (author) / Min Yang, (author) / Offrein, B. (author) / Vlasov, Y. (author)


    Publication date :

    2011-09-01


    Size :

    405024 byte





    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



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