To enable in-line nanophotonic device monitoring, grating couplers for near-vertical wafer-scale optical probing are fabricated in a standard CMOS process. These partially etched “optical probes” demonstrate a robust 3-dB-bandwidth larger than 80 nm allowing for photonic device characterization over the entire C-band throughout the fabrication process.


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    Titel :

    Grating couplers as optical probe pads in a standard CMOS process


    Beteiligte:
    Hofrichter, J. (Autor:in) / Green, W. M. J. (Autor:in) / Horst, F. (Autor:in) / Assefa, S. (Autor:in) / Min Yang, (Autor:in) / Offrein, B. (Autor:in) / Vlasov, Y. (Autor:in)


    Erscheinungsdatum :

    01.09.2011


    Format / Umfang :

    405024 byte





    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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