To enable in-line nanophotonic device monitoring, grating couplers for near-vertical wafer-scale optical probing are fabricated in a standard CMOS process. These partially etched “optical probes” demonstrate a robust 3-dB-bandwidth larger than 80 nm allowing for photonic device characterization over the entire C-band throughout the fabrication process.
Grating couplers as optical probe pads in a standard CMOS process
01.09.2011
405024 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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