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    Titel :

    Process conditions for the fabrication of subwavelength scale structures by x-ray lithography in PMMA films [5450-09]



    Kongress:

    Technical conference, Photonic crystal materials and nanostructures ; 2004 ; Strasbourg, France



    Erscheinungsdatum :

    01.01.2004


    Format / Umfang :

    9 pages




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Print


    Sprache :

    Englisch




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