Providing a compression corner shock wave/boundary layer interference model, and designing a state Mach number between Mach 1 and Mach 5; installing a manual transition tape at the upstream of the separation area; a U-shaped electrode cover plate is inserted into the insulating material; a groove array with the same size is formed in the upper surface of the insulating material so as to install a U-shaped electrode cover plate; two rows of grooves are formed in the surface of the insulating material in the flow direction; each row of grooves comprises a plurality of grooves which are uniformly distributed along the flow direction, and the adjacent grooves are kept at the same distance; cylindrical stepped holes are formed in the outward extending positions of the two ends of each row of grooves. The invention also provides a method for regulating and controlling the interference of the shock wave boundary layer by the multi-path plasmas. A plurality of plasma arrays are arranged in front of a separation area, a continuous impact disturbance effect is generated on a wave system structure by utilizing a strong impact effect and a heat effect of high-energy plasmas, and a hot gas mass is formed to regulate and control near-wall shock waves, so that the influence of a reverse pressure gradient on a boundary layer is reduced, and the low-frequency instability of the shock waves is improved; and flow separation induced by shock wave/boundary layer interference is slowed down.

    提供一种压缩拐角激波/边界层干扰模型,设计状态马赫数在马赫1到5之间;在分离区上游安装人工转捩带;在绝缘材料内部插入U形电极盖板;在绝缘材料上表面开相同大小的凹槽阵列以安装U形电极盖板;在绝缘材料表面沿流向布置两排凹槽;每排凹槽包括沿流向均匀分布的多个凹槽,相邻凹槽之间保持相同间距;在每排凹槽两端向外延伸处的设置圆柱阶梯孔。还提供一种多路等离子体调控激波边界层干扰的方法。本发明在分离区前布置多路等离子体阵列,利用高能等离子体的强烈冲击效应和热效应,对波系结构产生接续冲击扰动作用,形成热气团对近壁面激波进行调控,从而降低逆压梯度对边界层的影响,改善激波低频不稳定性,减缓激波/边界层干扰诱导的流动分离。


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    Titel :

    Method for regulating and controlling interference of shock wave boundary layer through multi-path plasmas


    Weitere Titelangaben:

    一种多路等离子体调控激波边界层干扰的方法


    Beteiligte:
    LIANG HUA (Autor:in) / YANG HESEN (Autor:in) / KONG XINYU (Autor:in) / WEI BIAO (Autor:in) / SU ZHI (Autor:in) / ZONG HAOHUA (Autor:in) / LI JINPING (Autor:in) / XIONG YOUDE (Autor:in) / WU YUN (Autor:in) / ZHANG DONGSHENG (Autor:in)

    Erscheinungsdatum :

    10.01.2025


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Chinesisch


    Klassifikation :

    IPC:    H05H Plasmatechnik , PLASMA TECHNIQUE / B64C AEROPLANES , Flugzeuge



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