To provide a space debris removal apparatus having a charging type film member which increases resistance.SOLUTION: A space debris removal apparatus 1 is mounted on a space debris 2 orbiting around the Earth and changes an orbit of the space debris 2 by reducing the orbital speed of the space debris 2. The space debris removal apparatus 1 includes: a film member 20 which has a first surface 21a facing the space debris 2 and a second surface 22a that is a surface opposite to the first surface 21a, and has such a configuration as to charge the first surface 21a and the second surface 22a to different potentials; a charging device 30 which is electrically connected to the film member 20 and charges the film member 20 so that the first surface 21a is charged to a negative potential lower than the second surface 22a by a predetermined potential difference; and a mounting device 40 for fitting the film member 20 to the space debris 2.SELECTED DRAWING: Figure 1

    【課題】帯電型の膜部材を有するスペースデブリ除去装置において、抗力を増大させる。【解決手段】スペースデブリ除去装置1は、地球を周回するスペースデブリ2に取り付けられ、スペースデブリ2の周回速度を低下させることによりスペースデブリ2の軌道を変更する。スペースデブリ除去装置1は、スペースデブリ2と対向する第1の面21aおよび第1の面21aと反対面の第2の面22aを有し、第1の面21aおよび第2の面22aを異なる電位に帯電可能な構造を有する膜部材20と、膜部材20と電気的に接続され、第1の面21aが第2の面22aよりも所定の電位差だけ低くなる負電位になるように膜部材20を帯電させる帯電装置30と、膜部材20をスペースデブリ2に取り付ける取付装置40とを備える。【選択図】図1


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    Titel :

    SPACE DEBRIS REMOVAL APPARATUS


    Weitere Titelangaben:

    スペースデブリ除去装置


    Beteiligte:
    MURANAKA TAKANOBU (Autor:in) / UENO KAZUMA (Autor:in) / OKUMURA TEPPEI (Autor:in) / OKAWA YASUSHI (Autor:in)

    Erscheinungsdatum :

    02.09.2021


    Medientyp :

    Patent


    Format :

    Elektronische Ressource


    Sprache :

    Japanisch


    Klassifikation :

    IPC:    B64G Raumfahrt , COSMONAUTICS



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