This paper presents the design and fabrication of 2×2 and 4×4 biaxial micro-electro-mechanical systems (MEMS) mirror array. The fabrication process was extended from that of previous single micromirror with SW electrodes that bases on silicon-on-insulator (SOI) wafer, hybrid bulk/surface micromachined technology, and a high-aspect-ratio shadow mask. Each mirror plate size is 1000μm×1000μm, thickness 35μm. The gap between mirror plate and bottom electrodes is 300μm. This mirror array is well-suited for application where a large optical aperture is required.


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    Titel :

    Design and fabrication of 2×2 and 4×4 biaxial micromirror array


    Beteiligte:
    Yanhui Bai, (Autor:in) / Yeow, J T W (Autor:in) / Wilson, B C (Autor:in)


    Erscheinungsdatum :

    01.10.2010


    Format / Umfang :

    2365008 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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