A method for improving the resolution of a lithographic system by an arbitrary amount (with no visibility reduction for incoherent mask methods) is proposed and demonstrated experimentally. The method simply relies on the sharpened features available through N-photon detection.


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    Titel :

    Super-resolution by nonlinear optical lithography


    Beteiligte:
    Bentley, S.J. (Autor:in) / Boyd, R.W. (Autor:in)


    Erscheinungsdatum :

    01.01.2003


    Format / Umfang :

    137294 byte



    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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