Fast optical scanning deflectometry has been introduced for the measurement of the surface figure of optical surfaces. The measurement principle is based on physical ray tracing by means of a narrow laser beam deflected by an oscillating mirror and a large lens arranged for telecentric scanning. A new design of an instrument capable of measuring 12-inch wafers within 60 s and with a slope resolution better 1 /spl mu/rad is presented.


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    Titel :

    Wafer topography measurement by fast optical scanning deflectometry


    Beteiligte:
    Krey, S. (Autor:in) / Peter, F. (Autor:in) / Dumitrescu, E. (Autor:in) / van Amstel, W.D. (Autor:in) / Klaver, R.G. (Autor:in) / Lous, E.J. (Autor:in)


    Erscheinungsdatum :

    01.01.2003


    Format / Umfang :

    48157 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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