A very shallow multilayer etched-grating is proposed as a wavelength demultiplexer. Two different configurations are compared for diffraction efficiency and resolution. Single-step-etch fabrication designs are presented and modeled for their grating efficiency and overall performance.


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    Titel :

    A shallow-etched multilayer grating-based wavelength demultiplexer in SOI


    Beteiligte:
    Bisaillon, E. (Autor:in) / Laniel, J. (Autor:in) / Jugessur, A. (Autor:in) / Kirk, A.G. (Autor:in)


    Erscheinungsdatum :

    01.01.2005


    Format / Umfang :

    223020 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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