Simple, inexpensive apparatus coats semiconductor wafers uniformly with hydrofluoric acid for etching. Apparatus made in part from small commercial electric-fan motor. Features bowl that collects acid. Silicon wafer placed on platform and centered on axis; motor switched on. As wafer spins, drops of hydrofluoric acid applied from syringe. Centrifugal force spreads acid across wafer in fairly uniform sheet.
Spinner For Etching Of Semiconductor Wafers
NASA Tech Briefs ; 13 , 4
01.04.1989
Sonstige
Keine Angabe
Englisch
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