Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD
Solar energy materials & solar cells ; 48 , 1-4 ; 269-278
1997
Aufsatz (Zeitschrift)
Englisch
High-rate deposition of polycrystalline silicon thin films by hot wire cell method using disilane
Online Contents | 2001
|Structural and electrical properties of polycrystalline silicon films deposited by hot-wire CVD
Online Contents | 2002
|Characterization of polycrystalline silicon thin films fabricated by excimer laser crystallization
British Library Online Contents | 2007
|Resistivity of doped polycrystalline silicon films.
NTRS | 1973
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