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    Title :

    Influence of Process Parameters on the Etching Rate in Inductively Coupled Plasma Etcher


    Contributors:
    Xiaonan, C. (author) / Peilin, Y. (author) / Xuanming, P. (author)

    Published in:

    Publication date :

    2004-01-01


    Size :

    2 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    Unknown


    Classification :

    DDC:    500



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