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    Title :

    An Approach for Measuring the Ellipsometric Parameters of Isotropic and Anisotropic Thin Films Using the Stokes Parameter Method


    Contributors:
    Lo, Y.-L. (author) / Hsieh, W.-H. (author) / Chung, Y.-F. (author) / Tsai, S.-A. (author)

    Published in:

    JOURNAL OF LIGHTWAVE TECHNOLOGY ; 30 , 14 ; 2299-2306


    Publication date :

    2012-01-01


    Size :

    8 pages



    Type of media :

    Article (Journal)


    Type of material :

    Print


    Language :

    English


    Classification :

    DDC:    621.3692




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