Silver (Ag) as a novel masking material in glass etching for microfluidics applications
MICROSYSTEM TECHNOLOGIES ; 19 , 2 ; 253-259
2013-01-01
7 pages
Article (Journal)
English
DDC: | 629.83 |
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Masking Technique for Ion-Beam Sputter Etching
NTRS | 1986
|NTIS | 1946
|Open-channel microfluidics : fundamentals and applications
TIBKAT | 2019
|