Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.


    Access

    Check access

    Check availability in my library

    Order at Subito €


    Export, share and cite



    Title :

    Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices


    Contributors:
    Chincholi, A. (author) / Banerjee, S. (author) / Huang, J. S. (author) / Klotzkin, D. (author)


    Publication date :

    2005-06-01


    Size :

    614237 byte



    Type of media :

    Conference paper


    Type of material :

    Electronic Resource


    Language :

    English



    Fabrication of Photonic Crystals by Holographic Lithography Method

    Yeo, J.B. / Lee, H.Y. | British Library Conference Proceedings | 2008



    Fabrication of Three-Dimensional Photonic Crystals by Holographic Lithography

    Ono, Y. / Ikemoto, K. / Optical Society of America | British Library Conference Proceedings | 2002


    Fabrication of Three-Dimensional Photonic Crystals by Holographic Lithography

    Ono, Y. / Ikemoto, K. / IEEE | British Library Conference Proceedings | 2001


    Fabrication of Complex Integrated Waveguide Filters Using Electron Beam Lithography

    Millar, P. / Liu, X. / De La Rue, R. et al. | IEEE | 1998