Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.
Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices
01.06.2005
614237 byte
Aufsatz (Konferenz)
Elektronische Ressource
Englisch
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