Multiple exposure interference lithography is a promising way to fabricate areas of photonic crystals areas lithographically mapped for easy integration with conventional waveguides or optical devices. Preliminary results on fabrication of square PCs are reported.


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    Titel :

    Parallel fabrication of photonic crystals (PC) using interference lithography for integrated waveguide-PC devices


    Beteiligte:
    Chincholi, A. (Autor:in) / Banerjee, S. (Autor:in) / Huang, J. S. (Autor:in) / Klotzkin, D. (Autor:in)


    Erscheinungsdatum :

    01.06.2005


    Format / Umfang :

    614237 byte



    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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