Silicon oxynitride films with varying oxygen/nitrogen ratios have been grown by PECVD using SiH/sub 4/, N/sub 2/O, N/sub 2/ and NH/sub 3/ gases. The refractive index of the film can be smoothly varied by changing the SiH/sub 4//N/sub 2/O flow ratio. Rectangular optical channel waveguides are successfully fabricated by growing a sandwich oxynitride structure together with dry etching. The waveguide propagation loss has been characterized and annealing is shown to be an effective means to reduce the loss significantly. A broader waveguide will also have much smaller loss than a narrow waveguide.


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    Titel :

    Characterization of PECVD oxynitride optical waveguides


    Beteiligte:
    Ailing Zhang, (Autor:in) / Kam Tai Chan, (Autor:in)


    Erscheinungsdatum :

    01.01.2003


    Format / Umfang :

    93366 byte




    Medientyp :

    Aufsatz (Konferenz)


    Format :

    Elektronische Ressource


    Sprache :

    Englisch



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