SU-8 as resist material for deep X-ray lithography
MICROSYSTEM TECHNOLOGIES ; 7 ; 11-16
01.01.2001
6 pages
Aufsatz (Zeitschrift)
Englisch
DDC: | 629.83 |
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Deep photo-lithography characterization of SU-8 resist layers
British Library Online Contents | 2005
|Resist-based neutral atom lithography
British Library Conference Proceedings | 1998
|Influence of mask substrate materials on resist sidewall roughness in deep X-ray lithography
British Library Online Contents | 2008
|Simulation of deep UV lithography with SU-8 resist by using 365 nm light source
British Library Online Contents | 2005
|Investigation to Ultra-Resolution Resist in Room-Temperature Imprint Lithography
British Library Online Contents | 2003
|